Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Use of plate oxide layers to increase bulk oxide thickness in semiconductor devices

Use of plate oxide layers to increase bulk oxide thickness in semiconductor devices

US Patent 8822296 · Granted Sep 2, 2014

Estimated economic value: $1,925,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Fan motor2025
Electrostatic discharge guard ring with snapback protection2025
Electrostatic discharge guard ring with complementary drain extended devices2024
Trench shield isolation layer2023
Electrostatic discharge guard ring with snapback protection2023
Vertical trench gate MOSFET with integrated Schottky diode2023
Drain-extended transistor2022
Semiconductor device including a lateral insulator2022
High voltage lateral junction diode device2022
Trench shield isolation layer2022
High-voltage drain expended MOS transistor2022
Vertical trench gate MOSFET with deep well region for junction termination2021