Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Technique for controlling trench profile in semiconductor structures

Technique for controlling trench profile in semiconductor structures

US Patent 8815744 · Granted Aug 26, 2014

Estimated economic value: $1,063,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Shoe washing machine2025
Post gate dielectric processing for semiconductor device fabrication2025
Method of manufacturing semiconductor devices and semiconductor devices2025
Container cover2025
Forming low-resistance capping layer over metal gate electrode2025
Chip structure with conductive layer2025
Coaxial speaker2025
Method for preparing ammonia by using ammonium salt and silicate2025
Coaxial speaker box2025
Preparation device and preparation method of ammonia gas2025
Coaxial speaker2025
Display substrate, display panel and display apparatus2025