Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of forming fine patterns of semiconductor device by using double patterning process which uses acid diffusion

Method of forming fine patterns of semiconductor device by using double patterning process which uses acid diffusion

US Patent 8778598 · Granted Jul 15, 2014

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Pose estimation apparatus and method for robotic arm to grasp target based on mo2024
Electronic device, method for driving electronic device, and method for controll2023
Method of forming mask pattern and method of fabricating semiconductor device us2021
Alumina powder, alumina slurry, alumina-containing coating layer, multilayer sep2020
Methods of forming patterns using compositions for an underlayer of photoresist2020
Cantilever set for atomic force microscopes, substrate surface inspection appara2019
Method of forming patterns for semiconductor device2019
Block copolymer and method of manufacturing integrated circuit device using the 2018
Methods of forming patterns of semiconductor devices2018
Method for fabricating semiconductor device including a via hole in a mask patte2018
Hard mask composition, carbon nanotube layer structure, pattern forming method, 2018
Method of forming pattern of semiconductor device2018