Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for analyzing masks for photolithography

Method for analyzing masks for photolithography

US Patent 8718354 · Granted May 6, 2014

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Apparatus and method for analyzing an element of a photolithography process with2024
Method for removing a particle from a mask system2023
Method for detecting a structure of a lithography mask and device for carrying o2021
Method for correcting the critical dimension uniformity of a photomask for semic2020
Pattern inspection apparatus, pattern position measurement apparatus, aerial ima2020
Method for analyzing a photomask2016
Microscope for reticle inspection with variable illumination settings2015
Method and apparatus for measuring structures on photolithography masks2014
Method and apparatus for measuring of masks for the photo-lithography2014
Method and device for measuring the relative local position error of one of the 2014
Microscope imaging system and method for emulating a high aperture imaging syste2013
Method and apparatus for analyzing a group of photolithographic masks2012