Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for exposing an area on a substrate to a beam and photolithographic system

Method for exposing an area on a substrate to a beam and photolithographic system

US Patent 8715910 · Granted May 6, 2014

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method of implanting an implant species into a substrate at different depths2023
Methods of forming semiconductor devices using aspect ratio dependent etching ef2021
Method for producing biomass which has a high exopolysaccharide content2020
Avalanche diode having an enhanced defect concentration level and method of maki2020
Methods of forming semiconductor devices using aspect ratio dependent etching ef2020
Method for producing a self-aligning masking layer2019
Method for processing a carrier, a carrier, an electronic device and a lithograp2019
Diode-based ESD concept for DEMOS protection2018
Avalanche diode having an enhanced defect concentration level and method of maki2017
Shaped sintered ceramic bodies composed of Y2O3-stabilized zirconium oxide and p2017
Method for processing a carrier, a carrier, an electronic device and a lithograp2017
Avalanche diode having an enhanced defect concentration level and method of maki2016