Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and system for forming low contact resistance device

Method and system for forming low contact resistance device

US Patent 8617955 · Granted Dec 31, 2013

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method for precision oxidation control by ion implantation2025
Method and apparatus for controlled ion implantation2025
Systems and methods for creating custom actions2024
Techniques to increase CMOS image sensor well depth by cyrogenic ion channeling 2023
Implant to form vertical FETs with self-aligned drain spacer and junction2023
Enhanced etch resistance for insulator layers implanted with low energy ions2022
Systems and methods for creating custom actions2022
Systems and methods for creating custom actions2021
Asymmetric gate spacer formation using multiple ion implants2021
Process and system for uniformly crystallizing amorphous silicon substrate by fi2021
Techniques for implementing batch processing in a database system2020
System and method for improved scanned spot beam2020