Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Modeling thin-film stack topography effect on a photolithography process

Modeling thin-film stack topography effect on a photolithography process

US Patent 8423917 · Granted Apr 16, 2013

Estimated economic value: $9,653,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Organic solid biomass conversion for liquid fuels/chemicals production in the pr2024
Catalyst structure and method of upgrading hydrocarbons in the presence of the c2023
Method of light oil desulfurization in the presence of methane containing gas en2023
Inverse etch model for mask synthesis2023
Catalyst structure and method of upgrading hydrocarbons in the presence of the c2022
3D resist profile aware resolution enhancement techniques2021
3D resist profile aware resolution enhancement techniques2021
Fabric items with thermally imprinted light-emitting regions2021
Method for modeling a photoresist profile2019
Method for modeling a photoresist profile2019
Method for preparing trench isolation structure2018
3D resist profile aware etch-bias model2017