Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Workpiece de-chucking device of plasma reactor for dry-cleaning inside of reaction chamber and electrostatic chuck during workpiece de-chucking, and workpiece de-chucking method using the same

Workpiece de-chucking device of plasma reactor for dry-cleaning inside of reaction chamber and electrostatic chuck during workpiece de-chucking, and workpiece de-chucking method using the same

US Patent 8398783 · Granted Mar 19, 2013

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Three-dimensional semiconductor memory device and electronic system including th2025
Three-dimensional semiconductor memory devices2024
Semiconductor devices and data storage systems including the same2024
Three-dimensional nonvolatile memory device and a method of fabricating the same2024
Semiconductor device2023
Methods of manufacturing vertical memory devices2023
Three-dimensional semiconductor memory devices2023
Three-dimensional semiconductor memory devices2023
Controlling charging voltage2022
Vertical memory devices and methods of manufacturing the same2021
Semiconductor memory device2020
Semiconductor memory device and method of fabricating the same2019