Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus for using aerial image sensitivity to model mask errors

Method and apparatus for using aerial image sensitivity to model mask errors

US Patent 8355807 · Granted Jan 15, 2013

Estimated economic value: $8,746,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method for training or using a process model for determining a pattern in a patt2025
Etch bias characterization and method of using the same2025
Determining metrics for a portion of a pattern on a substrate2025
Etch bias characterization and method of using the same2023
Compact modeling for the negative tone development processes2020
Edge-based full chip mask topography modeling2014
Performing image calculation based on spatial coherence2014
Modeling mask errors using aerial image sensitivity2014
Modeling mask errors using aerial image sensitivity2014
System and technique for modeling resist profile change sensitivity at different2014
Evaluating the quality of an assist feature placement based on a focus-sensitive2012
Etch-aware OPC model calibration by using an etch bias filter2012