Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for reducing line width roughness with plasma pre-etch treatment on photoresist

Method for reducing line width roughness with plasma pre-etch treatment on photoresist

US Patent 8329585 · Granted Dec 11, 2012

Estimated economic value: $5,034,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Magnetically mountable cable hub2025
Universal mobile device mount2025
Cup liner for blender2025
Computer tablet caddy2025
Tablet computer2023
Point of sale device2023
Point of sale device2023
Light-emitting diode display pixels with microlens stacks over light-emitting di2023
Pair of shoes2023
Doping control of metal nitride films2023
In-situ deposition process2022
Point of sale device2022