Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and system for use in monitoring properties of patterned structures

Method and system for use in monitoring properties of patterned structures

US Patent 8289515 · Granted Oct 16, 2012

Estimated economic value: $1,578,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

System and method for detecting physical characteristics of a multilayered tissu2025
Monitoring system and method for verifying measurements in patterned structures2024
System and method for performing tear film structure measurement2024
Apparatus and methods for calibrating optical measurements2024
System and method for performing tear film structure measurement2021
Apparatus and methods for performing tomography and/or topography measurements o2020
Analyte-sensing device2020
Apparatus and method for detecting surface topography2019
Method for analyzing an object2019
System for analyzing optical properties of an object2019
Monitoring system and method for verifying measurements in patterned structures2019
Interferometric ellipsometry and method using conical refraction2018