Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › High frequency power source and its control method, and plasma processing apparatus

High frequency power source and its control method, and plasma processing apparatus

US Patent 8286581 · Granted Oct 16, 2012

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method and system for controlling profile of critical dimension2024
Plasma control apparatus2021
Plasma processing apparatus and method2020
Plasma processing apparatus and method2020
Plasma processing apparatus and method2020
Substrate processing apparatus and substrate processing method2019
Connection control method2018
Systems, apparatus, and methods for energy monitoring2018
Substrate processing apparatus and substrate processing method using same2017
Plasma processing apparatus and method2016
Metal filling apparatus2015
Systems and methods for plug load control and management2015