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Home › Process for removing high stressed film using LF or HF bias power and capacitively coupled VHF source power with enhanced residue capture

Process for removing high stressed film using LF or HF bias power and capacitively coupled VHF source power with enhanced residue capture

US Patent 8123969 · Granted Feb 28, 2012

Estimated economic value: $8,688,000 ⓘ

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