Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Exposure apparatus with improved alignment mark position measurement condition setting feature, and device manufacturing method using the same

Exposure apparatus with improved alignment mark position measurement condition setting feature, and device manufacturing method using the same

US Patent 8107051 · Granted Jan 31, 2012

Estimated economic value: $210,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Processing system, processing method, measurement apparatus, substrate processin2024
Method of determining set of sample shot regions, method of obtaining measuremen2024
Processing system, processing method, measurement apparatus, substrate processin2023
Alignment apparatus, alignment method, lithography apparatus, and method of manu2022
Measurement apparatus, exposure apparatus, and method of manufacturing article2021
Pattern forming apparatus, deciding method, storage medium, information processi2020
Lithography apparatus and article manufacturing method2019
Measurement apparatus, lithography apparatus, and method of manufacturing articl2019
Exposure apparatus, exposure method, and device manufacturing method2017
Management apparatus and management method2016
Mark position detection apparatus2013
USB host system and method for transferring transfer data2011