Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for forming silicon carbide film containing oxygen

Method for forming silicon carbide film containing oxygen

US Patent 8080282 · Granted Dec 20, 2011

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Exposure apparatus, method for manufacturing device, method for manufacturing fl2025
Stretching machine and rail for stretching machine2025
Optics ring modulator including grating pillar2025
Methods for forming a boron nitride film by a plasma enhanced atomic layer depos2025
Vehicle-mounted sensing system and gated camera2025
Vehicle-mounted sensing system and gated camera2025
Method for forming insulation film2025
Methods for forming a topographically selective silicon oxide film by a cyclical2025
Interlayer film for laminated glass and laminated glass2023
Method for forming silicon nitride film selectively on top/bottom portions2023
Method for depositing silicon-free carbon-containing film as gap-fill layer by p2023
Method of topology-selective film formation of silicon oxide2023