Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Determining endpoint in a substrate process

Determining endpoint in a substrate process

US Patent 7808651 · Granted Oct 5, 2010

Estimated economic value: $8,418,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Endpoint detection system for enhanced spectral data collection2025
Autonomous substrate processing system2025
Etch feedback for control of upstream process2025
Etalon thermometry for plasma environments2024
Adjustable achromatic collimator assembly for endpoint detection systems2024
Endpoint detection in low open area and/or high aspect ratio etch applications2024
Endpoint detection system for enhanced spectral data collection2024
Substrate process endpoint detection using machine learning2024
In-situ optical chamber surface and process sensor2023
Adjustable achromatic collimator assembly for endpoint detection systems2023
Autonomous substrate processing system2023
Eliminating internal reflections in an interferometric endpoint detection system2022