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Home › System and method for providing a nitride cap over a polysilicon filled trench to prevent formation of a vertical bird's beak structure in the manufacture of a semiconductor device

System and method for providing a nitride cap over a polysilicon filled trench to prevent formation of a vertical bird's beak structure in the manufacture of a semiconductor device

US Patent 7776708 · Granted Aug 17, 2010

Estimated economic value: $5,471,000 ⓘ

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