Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and system for manufacturing a reticle using character projection particle beam lithography

Method and system for manufacturing a reticle using character projection particle beam lithography

US Patent 7759026 · Granted Jul 20, 2010

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Computing parasitic values for semiconductor designs2025
Methods and systems to determine parasitics for semiconductor or flat panel disp2025
Generating and display an animation of a predicted overlap shape in an IC design2025
Computing parasitic values for semiconductor designs2025
Methods and systems to determine shapes for semiconductor or flat panel display 2025
Methods and systems for reticle enhancement technology of a design pattern to be2025
Key blank2025
Cylinder lock2025
Method and system for reticle enhancement technology2025
Methods and systems for reticle enhancement technology of a design pattern to be2025
Method and system for determining a charged particle beam exposure for a local p2025
Method for reticle enhancement technology of a design pattern to be manufactured2024