Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Apparatus and method for photomask design

Apparatus and method for photomask design

US Patent 7743359 · Granted Jun 22, 2010

Estimated economic value: $2,951,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Retaining device for mounting a slide rail to a server rack2025
Finding semiconductor defects using convolutional context attributes2025
Method of manufacturing integrated circuit2025
Method of manufacturing a semiconductor device and apparatus for manufacturing t2025
Inspection of reticles using machine learning2024
Test pattern generation systems and methods2024
Method of mask data synthesis and mask making2024
Inspection with previous step subtraction2024
Method for mask data synthesis with wafer target adjustment2023
Setting up inspection of a specimen2023
Method of manufacturing a semiconductor device and apparatus for manufacturing t2023
Lithography simulation method2023