Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for adjusting a critical dimension in a high aspect ratio feature

Method for adjusting a critical dimension in a high aspect ratio feature

US Patent 7732340 · Granted Jun 8, 2010

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Pseudo-static random-access memory and reading method thereof2025
Method of cleaning stage in plasma processing apparatus, and the plasma processi2024
Vehicle brake system2024
Plasma processing apparatus and plasma processing method2024
Method of cleaning stage in plasma processing apparatus, and the plasma processi2024
Semiconductor memory device including control unit controlling time interval of 2023
Target object processing method and plasma processing apparatus2023
Plasma processing apparatus, processing method, and upper electrode structure2022
Plasma processing apparatus and plasma processing method2022
Plasma processing method2022
Plasma processing apparatus and method for controlling radio-frequency power sup2022
Plasma processing apparatus and plasma etching method2021