Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Voltage non-uniformity compensation method for high frequency plasma reactor for the treatment of rectangular large area substrates

Voltage non-uniformity compensation method for high frequency plasma reactor for the treatment of rectangular large area substrates

US Patent 7687117 · Granted Mar 30, 2010

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Display device2025
Light-guide for gesture-detecting interface module2023
Image-generation device for a head-up display and method for controlling such a 2021
Plasma reactor vessel having improved plasma uniformity comprised of a first ele2020
Compact vehicle head-up display2019
Projection system for display, in particular a heads-up display, and associated 2019
Device and method for emitting a light beam intended to form an image, projectio2019
System and method for controlling the luminosity of a head-up display and displa2019
Device and method for emitting a light beam intended to form an image, projectio2018
Device and method for emitting a light beam intended to form an image, projectio2018
Method and device for detecting the position of the face of a person, in particu2018
System and method for projecting an image and display using said system2018