Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Methods for critical dimension control during plasma etching

Methods for critical dimension control during plasma etching

US Patent 7622051 · Granted Nov 24, 2009

Estimated economic value: $43,132,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Edge seal for lower electrode assembly2025
Networked games, rides and attractions2024
Theme or amusement park attraction using high frame rate active shutter technolo2023
Edge seal for lower electrode assembly2023
Network gaming ride attraction2020
Edge ring dimensioned to extend lifetime of elastomer seal in a plasma processin2020
Universal non-invasive chamber impedance measurement system and associated metho2018
Window and mounting arrangement for twist-and-lock gas injector assembly of indu2018
Edge seal for lower electrode assembly2018
Edge seal for lower electrode assembly2018
Long lifetime thermal spray coating for etching or deposition chamber applicatio2017
Installation fixture for elastomer bands2017