Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › System and method for providing defect printability analysis of photolithographic masks with job-based automation

System and method for providing defect printability analysis of photolithographic masks with job-based automation

US Patent 7617474 · Granted Nov 10, 2009

Estimated economic value: $4,782,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method for computational metrology and inspection for patterns to be manufacture2025
Technique for repairing an EUV photo-mask2016
Multistage extreme ultra-violet mask qualification2015
Determining source patterns for use in photolithography2014
Electron-beam image reconstruction2014
Technique for repairing a reflective photo-mask2013
Full-field mask error enhancement function2013
Extending the field of view of a mask-inspection image2013
Photo-mask acceptance technique2013
Virtual photo-mask critical-dimension measurement2013
Method for facilitating automatic analysis of defect printability2012
Technique for correcting hotspots in mask patterns and write patterns2011