Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Semiconductor device having a gate insulating film structure including an insulating film containing metal, silicon and oxygen and manufacturing method thereof

Semiconductor device having a gate insulating film structure including an insulating film containing metal, silicon and oxygen and manufacturing method thereof

US Patent 7544593 · Granted Jun 9, 2009

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Optical measurement apparatus2025
Vapor phase growth method using reflector with changeable pattern2025
Command generation device and command generation method in multiple power genera2025
Distance measurement device and distance measurement method2025
Light emitting element and method for manufacturing same2025
Command generation device and command generation method2024
Semiconductor memory and method of manufacturing the same2024
Combined electric power generations' supply system in off grid independent opera2024
Absorbance analysis apparatus for DCR gas, absorbance analysis method for DCR ga2023
Semiconductor device and method of manufacturing the same2023
Film forming apparatus, source supply apparatus, and film forming method2023
Camera calibration information acquisition device, image processing device, came2023