Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus for thermally processing microelectronic workpieces

Method and apparatus for thermally processing microelectronic workpieces

US Patent 7541299 · Granted Jun 2, 2009

Estimated economic value: $4,117,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Methods and apparatus for measuring temperature using centerfind systems2025
Modular mainframe layout for supporting multiple semiconductor process modules o2025
Methods and systems for temperature control for a substrate2025
Servo-control system2025
Methods and systems of optical inspection of electronic device manufacturing mac2025
Disturbance compensation for substrate processing recipes2024
Methods and systems for temperature control for a substrate2024
Modular mainframe layout for supporting multiple semiconductor process modules o2024
Modular mainframe layout for supporting multiple semiconductor process modules o2024
Temperature-controllable process chambers, electronic device processing systems,2023
Servo-control system2023
Calibration of an aligner station of a processing system2023