Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Lithography process optimization and system

Lithography process optimization and system

US Patent 7537870 · Granted May 26, 2009

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Defect prediction2022
Methods and patterning devices and apparatuses for measuring focus performance o2021
Mask process aware calibration using mask pattern fidelity inspections2020
Lens heating aware source mask optimization for advanced lithography2018
MEEF reduction by elongation of square shapes2011
Photomask and method of making thereof2011
Semiconductor processing system with ultra low-K dielectric2009
Method and algorithm for the control of critical dimensions in a thermal flow pr2009
Enabling nanostructured materials via multilayer thin film precursor and applica2005