Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of forming titanium film by CVD

Method of forming titanium film by CVD

US Patent 7484513 · Granted Feb 3, 2009

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Deposition device and deposition method2020
Method of forming conformal metal silicide films2014
Ti-containing film formation method and storage medium2012
Substrate processing method and substrate processing apparatus2012
Processing apparatus and heater unit2012
Particle-measuring system and particle-measuring method2012
Film forming method2011
Film formation processing apparatus and method for determining an end-point of a2011
Processing apparatus with a chamber having therein a high-corrosion-resistant sp2011
Processing apparatus with a chamber having therein a high-corrosion-resistant sp2010
Gas processing apparatus, gas processing method and integrated valve unit for ga2010
Method of forming a metal film for electrode2010