Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Composition for the removing of sidewall residues

Composition for the removing of sidewall residues

US Patent 7417016 · Granted Aug 26, 2008

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Aqueous, nitrogen-free cleaning composition and its use for removing residues an2016
Aqueous alkaline cleaning compositions and methods of their use2015
Aqueous alkaline cleaning compositions and methods of their use2015
Stabilized etching solutions for CU and CU/NI layers2014
Aqueous solution for removing post-etch residue2011
Composition for the removal of sidewall residues2009
Composition for the removal of sidewall residues2009
Composition for the removal of sidewall residues2009
Composition for the removal of sidewall residues2009
Composition for the removal of sidewall residues2009
Etching solution comprising hydrofluoric acid2009
Buffer solutions for suspensions used in chemical-mechanical polishing2002