Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for optimizing a photolithographic mask

Method for optimizing a photolithographic mask

US Patent 7370313 · Granted May 6, 2008

Estimated economic value: $508,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Methods, devices and computer program products for global bundle adjustment of 32021
Methods, devices and computer program products for gradient based depth reconstr2021
Optical system, apparatus and method for operating an apparatus using helmholtz 2018
Lithography systems and methods of manufacturing using thereof2014
Lithographic mask and method of forming a lithographic mask2012
Lithographic mask and method of forming a lithographic mask2012
Method of double patterning, method of processing a plurality of semiconductor w2011
Filter system for light source2011
Methods of compensating lens heating, lithographic projection system and photo m2010
Method of fabricating a semiconductor device2010
Methods for generating sublithographic structures2010
Method for manufacturing a structure in a semiconductor device and a structure i2010