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Home › Fluorinated monomers, fluorinated polymers having polycyclic groups with fused 4-membered heterocyclic rings, useful as photoresists, and processes for microlithography

Fluorinated monomers, fluorinated polymers having polycyclic groups with fused 4-membered heterocyclic rings, useful as photoresists, and processes for microlithography

US Patent 7326796 · Granted Feb 5, 2008

Estimated economic value: $24,189,000 ⓘ

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