Fluorinated polymers useful as photoresists, and processes for microlithography

Assignee

• E.I. Du Pont De Nemours And

Inventors

• Andrew Edward Feiring (84 patents)
• Frank Leonard Schadt, III (42 patents)
• William B. Farnham (65 patents)
• Jerald Feldman (82 patents)

View full patent text on Google Patents →