Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus for correcting gravitational sag in photomasks used in the production of electronic devices

Method and apparatus for correcting gravitational sag in photomasks used in the production of electronic devices

US Patent 7239376 · Granted Jul 3, 2007

Estimated economic value: $6,885,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Centering substrates on a chuck2019
Tapered gate oxide in LDMOS devices2018
Centering substrates on a chuck2018
Structures with contact trenches and isolation trenches2018
Semiconductor device with metal extrusion formation2017
Semiconductor device with metal extrusion formation2017
Apparatus and method for centering substrates on a chuck2017
Dual shallow trench isolation (STI) structure for field effect transistor (FET)2017
Semiconductor device with metal extrusion formation2017
Method and apparatus for detecting foreign material on a chuck2016
Controlled metal extrusion opening in semiconductor structure and method of form2016
Low leakage, high frequency devices2016