Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Hydrogen plasma photoresist strip and polymeric residue cleanup process for low dielectric constant materials

Hydrogen plasma photoresist strip and polymeric residue cleanup process for low dielectric constant materials

US Patent 7232768 · Granted Jun 19, 2007

Estimated economic value: $17,017,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Small grain size polysilicon engineering for threshold voltage mismatch improvem2025
Gate oxide fabrication and system2024
IC having trench-based metal-insulator-metal capacitor2023
Integrated fluxgate device2022
IC having trench-based metal-insulator-metal capacitor2021
Integrated fluxgate device2021
High performance fluxgate device2020
Process for NiFe fluxgate device2019
Magnetic core2019
Magnetic field annealing for integrated fluxgate sensors2018
Selective patterning of titanium encapsulation layers2018
Process for NiFe fluxgate device2017