{"@context": "https://schema.org", "@type": "BreadcrumbList", "itemListElement": [{"@type": "ListItem", "position": 1, "name": "Home", "item": "https://www.patentleaderboard.com/"}, {"@type": "ListItem", "position": 2, "name": "Selectively deposited silicon oxide layers on a silicon substrate", "item": "https://www.patentleaderboard.com/patent/7214979"}]}
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Home › Selectively deposited silicon oxide layers on a silicon substrate

Selectively deposited silicon oxide layers on a silicon substrate

US Patent 7214979 · Granted May 8, 2007

Estimated economic value: $1,698,000 ⓘ

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