Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source

Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source

US Patent 7196342 · Granted Mar 27, 2007

Estimated economic value: $12,770,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Nozzle apparatus2025
Guiding device and associated system2025
Robust fluid coupling apparatus2025
Volumetric dynamic depth delineation2024
Prolonging optical element lifetime in an EUV lithography system2023
Guiding device and associated system2023
Apparatus and method for extending target material delivery system lifetime2023
Method of and apparatus for in-situ repair of reflective optic2022
Prolonging optical element lifetime in an EUV lithography system2022
Guiding device and associated system2021
Apparatus for and method of source material delivery in a laser produced plasma 2020
Faceted EUV optical element2020