Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Methods for planarization of dielectric layer around metal patterns for optical efficiency enhancement

Methods for planarization of dielectric layer around metal patterns for optical efficiency enhancement

US Patent 7196012 · Granted Mar 27, 2007

Estimated economic value: $3,255,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method and system for failure predication of cooling fan2025
Optical sensor and methods of making the same2024
Biometric sensor and methods thereof2024
Multi-wafer integration2024
Optical sensor and methods of making the same2024
Apparatus for reducing optical cross-talk in image sensors2023
Optical sensor and methods of making the same2022
Biometric sensor and methods thereof2022
Apparatus for reducing optical cross-talk in image sensors2021
Wafer level integrated MEMS device enabled by silicon pillar and smart cap2021
Wafer level integrated MEMS device enabled by silicon pillar and smart cap2021
Biometric sensor and methods thereof2020