Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for offsetting a silicide process from a gate electrode of a semiconductor device

Method for offsetting a silicide process from a gate electrode of a semiconductor device

US Patent 7179745 · Granted Feb 20, 2007

Estimated economic value: $8,070,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method for precision oxidation control by ion implantation2025
Managing metadata for external content within a computing environment2025
Managing multi-tenant keys in multi-tenant computing environments2025
Systems and methods for creating custom actions2024
Gas turbine engine2024
Implant to form vertical FETs with self-aligned drain spacer and junction2023
Gas turbine engine2023
Gas turbine engine2023
Enhanced etch resistance for insulator layers implanted with low energy ions2022
Gas turbine engine control system and method for limiting turbine overspeed in c2022
Systems and methods for creating custom actions2022
Managing metadata for external content within a computing environment2022