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Home › Method for optimizing a number of kernels used in a sum of coherent sources for optical proximity correction in an optical microlithography process

Method for optimizing a number of kernels used in a sum of coherent sources for optical proximity correction in an optical microlithography process

US Patent 7127699 · Granted Oct 24, 2006

Estimated economic value: $14,060,000 ⓘ

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