Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and system for dynamically adjusting metrology sampling based upon available metrology capacity

Method and system for dynamically adjusting metrology sampling based upon available metrology capacity

US Patent 7076321 · Granted Jul 11, 2006

Estimated economic value: $11,570,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Adjusting weighting of a parameter relating to fault detection based on a detect2014
Method and apparatus for predicting yield parameters based on fault classificati2010
Method and apparatus for scheduling a plurality of processing tools2010
Method and apparatus for modifying process selectivities based on process state 2010
Method and apparatus for controlling a film formation process with multiple obje2009
Method and apparatus for selecting wafers for sampling2008
Method and apparatus for scheduling metrology based on a jeopardy count2007
Method and system for dynamically selecting wafer lots for metrology processing2007
Method and apparatus for calibrating degradable components using process state d2006
Standing weightlifting apparatus2006
Method and apparatus for fault classification based on residual vectors2006
Method and apparatus for implementing competing control models2006