Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Modified clean chemistry and megasonic nozzle for removing backside CMP slurries

Modified clean chemistry and megasonic nozzle for removing backside CMP slurries

US Patent 7067015 · Granted Jun 27, 2006

Estimated economic value: $13,099,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Galvanometer positioning tool and laser printer2025
MEMS microphone and preparation method therefor2024
Micro-Electro-Mechanical System device2023
Method and circuit for obtaining capacitive feedback signal of capacitive feedba2022
Substituted pyrrolo[2,1-f][1,2,4]triazines as FGFR inhibitors2022
Substituted pyrrolo[2,1-f][1,2,4]triazines as FGFR inhibitors2021
Manufacturing method of MEMS chip2018
Smart home hub2018
Parallel plate capacitor and acceleration sensor comprising same2018
MEMS chip and manufacturing method therefor2017
Monitoring structure and monitoring method for silicon wet etching depth2015
Vapor deposition system using benzotriazole (BTA) and isopropyl alcohol for prot2009