Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Gas chemistry cycling to achieve high aspect ratio gapfill with HDP-CVD

Gas chemistry cycling to achieve high aspect ratio gapfill with HDP-CVD

US Patent 7052552 · Granted May 30, 2006

Estimated economic value: $15,443,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Feed-forward of multi-layer and multi-process information using XPS and XRF tech2023
Feed-forward of multi-layer and multi-process information using XPS and XRF tech2021
Feed-forward of multi-layer and multi-process information using XPS and XRF tech2020
Thermal scavenging system to remove residue from interior surface of seamless tu2018
Feed-forward of multi-layer and multi-process information using XPS and XRF tech2018
Multi-step tube of a ceramic material and gas discharge tube made of the same2017
Colored razor blades2010
Method of depositing an amorphous carbon film for etch hardmask application2009
Liquid precursors for the CVD deposition of amorphous carbon films2008
Colored razor blades2007
Method for producing gate stack sidewall spacers2007
Method for high aspect ratio HDP CVD gapfill2006