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Home › Photosensitive resin composition, photosensitive element using the same, method for producing resist pattern, resist pattern and substrate having the resist pattern laminated thereon

Photosensitive resin composition, photosensitive element using the same, method for producing resist pattern, resist pattern and substrate having the resist pattern laminated thereon

US Patent 7049036 · Granted May 23, 2006

Estimated economic value: $135,000 ⓘ

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