MU

Mikio Uzawa

HC Hitachi Chemical Company: 1 patents #1,071 of 1,946Top 60%
📍 Ibaraki, JP: #4,343 of 6,779 inventorsTop 65%
Overall (All Time): #3,417,593 of 4,157,543Top 85%
1
Patents All Time

Issued Patents All Time

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
7049036 Photosensitive resin composition, photosensitive element using the same, method for producing resist pattern, resist pattern and substrate having the resist pattern laminated thereon Kuniaki Satou, Takahiko Kutsuna, Toshizumi Yoshino, Takao Hirayama 2006-05-23