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Home › High sensitivity crosslinkable photoresist composition, based on soluble, film forming dendrimeric calix[4] arene compositions method and for use thereof

High sensitivity crosslinkable photoresist composition, based on soluble, film forming dendrimeric calix[4] arene compositions method and for use thereof

US Patent 7037638 · Granted May 2, 2006

Estimated economic value: $4,743,000 ⓘ

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