Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Photolithography mask and method of fabricating a photolithography mask

Photolithography mask and method of fabricating a photolithography mask

US Patent 7011909 · Granted Mar 14, 2006

Estimated economic value: $74,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Lithographic mask and method of forming a lithographic mask2012
Method of double patterning, method of processing a plurality of semiconductor w2011
Filter system for light source2011
Method of fabricating a semiconductor device2010
Methods for generating sublithographic structures2010
Method for manufacturing a structure in a semiconductor device and a structure i2010
Method of fabricating an integrated circuit2010
Method for forming a structure on a substrate and device2010
Semiconductor device, method for manufacturing a semiconductor device and mask f2009
Method for optimizing a photolithographic mask2008
Phase mask for projection lithography and method for the manufacture thereof1995
Phase mask for projection lithography and method for the manufacture thereof com1994