Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › In-situ cleaning of beam defining apertures in an ion implanter

In-situ cleaning of beam defining apertures in an ion implanter

US Patent 6992311 · Granted Jan 31, 2006

Estimated economic value: $1,772,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Single-slot tubular cathode2024
Variable thickness ion source extraction plate2023
Ion source with single-slot tubular cathode2023
Shaped repeller for an indirectly heated cathode ion source2022
Ion source with single-slot tubular cathode2021
Ion source with multiple configurations2021
Cylindrical shaped arc chamber for indirectly heated cathode ion source2020
Dynamic temperature control of an ion source2019
Ion source for enhanced ionization2019
Dual material repeller2017
Ion source and a method for in-situ cleaning thereof2015
Indirectly heated cathode cartridge design2015