Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and system for determining optimum optical proximity corrections within a photolithography system

Method and system for determining optimum optical proximity corrections within a photolithography system

US Patent 6982136 · Granted Jan 3, 2006

Estimated economic value: $22,329,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Advanced process control framework using two-dimensional image analysis2011
System and method for integrated circuit device design and manufacture using opt2010
System and method for designing an integrated circuit device2009
Optimizing an integrated circuit layout by taking into consideration layout inte2007
System and method for integrated circuit device design and manufacture using opt2007
Method and system for metrology recipe generation and review and analysis of des2007
System and method for design rule creation and selection2007
Method and system for determining optimum optical proximity corrections within a2004