Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for fabricating nanoscale patterns in light curable compositions using an electric field

Method for fabricating nanoscale patterns in light curable compositions using an electric field

US Patent 6964793 · Granted Nov 15, 2005

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

System and method for modification of substrates2025
Heterogeneous integration of components onto compact devices using moiré based m2025
Nanoscale thin film deposition systems2024
Nanoscale-aligned three-dimensional stacked integrated circuit2024
Nanofabrication and design techniques for 3D ICs and configurable ASICs2024
Heterogeneous integration of components onto compact devices using moiré based m2024
Catalyst influenced chemical etching for fabricating three-dimensional SRAM arch2024
Wafer-scale programmable films for semiconductor planarization and for imprint l2023
Roll-to-roll programmable film imprint lithography2023
Nanoscale-aligned three-dimensional stacked integrated circuit2023
Heterogeneous integration of components onto compact devices using moire based m2022
Catalyst influenced chemical etching for fabricating three-dimensional SRAM arch2022