Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Etching of hard masks

Etching of hard masks

US Patent 6926843 · Granted Aug 9, 2005

Estimated economic value: $5,698,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

High-k/metal gate transistor with L-shaped gate encapsulation layer2016
High-k/metal gate transistor with L-shaped gate encapsulation layer2016
Selective deposition of germanium spacers on nitride2014
Transistor and method of forming the transistor so as to have reduced base resis2014
High-k dielectric gate structures resistant to oxide growth at the dielectric/si2013
Field effect device with reduced thickness gate2013
High-k dielectric gate structures resistant to oxide growth at the dielectric/si2012
Addition of ballast hydrocarbon gas to doped polysilicon etch masked by resist2012
Structure and method to control oxidation in high-k gate structures2011
Metal oxide field effect transistor with a sharp halo2010
Subgroundrule space for improved metal high-k device2010
Selective deposition of germanium spacers on nitride2010