Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for forming a region of low dielectric constant nanoporous material using a microemulsion technique

Method for forming a region of low dielectric constant nanoporous material using a microemulsion technique

US Patent 6899857 · Granted May 31, 2005

Estimated economic value: $260,000 ⓘ

Assignee

No assignee recorded.

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method for decolorizing textiles2023
CMP wafer edge control of dielectric2017
Isolation for embedded devices2016
CMP head structure2016
CMP head structure2016
Method for forming through silicon via with wafer backside protection2016
Litho scanner alignment signal improvement2015
Filament free silicide formation2015
Method for forming through silicon via with wafer backside protection2015
STI CMP under polish monitoring2014
CD control2014
Spacer profile engineering using films with continuously increased etch rate fro2014